Title:
人工水晶部材、露光装置、及び露光装置の製造方法
Document Type and Number:
Japanese Patent JP4666157
Kind Code:
B2
Abstract:
An exposure apparatus includes an illumination optical system configured to illuminate a mask by using a laser beam having a wavelength shorter than 250 nm as a light source, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed substrate, in which an optical element made of a synthetic quartz member is disposed in the illumination optical system and/or the projection optical system. The synthetic quartz member satisfies the following conditions of initial transmittance relative to light having a wavelength of 150 nm being equal to or above 60% per centimeter, striae therein satisfying either grade 1 or grade 2 as defined in Japan Optical Glass Industry Society Standard (JOGIS), an absorption coefficient ± for an infrared absorption band of a hydroxyl group located at 3585 cm -1 being equal to or below 0.035/cm, and the content of aluminum being equal to or below 1 ppm while the content of lithium being equal to or below 0.5 ppm.
Inventors:
Masashi Mizuguchi
Norio Komine
Hiroki Jimbo
Norio Komine
Hiroki Jimbo
Application Number:
JP2005511548A
Publication Date:
April 06, 2011
Filing Date:
July 09, 2004
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
C30B29/18; G02B1/02; G02B5/04; G03F7/20; H01L21/027; C01B33/12
Domestic Patent References:
| JPH09227294A | 1997-09-02 |
Attorney, Agent or Firm:
Noriaki Nagahama