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Patent Searching and Data


Title:
MANUFACTURING METHOD OF BALANCE SPRING
Document Type and Number:
Japanese Patent JP2015179013
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a balance spring that manufactures a balance spring for a timepiece made up of silicon with high accuracy.SOLUTION: A manufacturing method of a balance spring is configured to: provide a process of forming a first mask pattern 10 corresponding to a shape of a balance spring composed of a collet, main spring unit, and a spring-holding stud in a top part of an SOI substrate and a second mask pattern 20 having a uniform interval relative to the first mask pattern 10 in a coarse portion of the first mask pattern 10; apply dry etching using a deep digging RIE art to form the main spring under the first mask pattern and form a second active layer shape under the second mask pattern 20; and separate the main spring and the active layer shape through a lift-off process. An interval between the first mask pattern 10 and the second mak pattern 20 is close and uniform, and thereby, side etching is not caused, which in turn obtains the main spring excellent in dimensional accuracy and perpendicularity.

Inventors:
ABE YOSUKE
Application Number:
JP2014056432A
Publication Date:
October 08, 2015
Filing Date:
March 19, 2014
Export Citation:
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Assignee:
CITIZEN HOLDINGS CO LTD
International Classes:
G04B17/06; B81C1/00; F16F1/10; G04B17/22
Attorney, Agent or Firm:
Akira Miyajima