To prevent temporal changes in the shape of a bimorph element.

This manufacturing method of a bimorph element comprises a metal layer formation step of forming a metal layer on a sacrifice layer; an annealing step of annealing the metal layer formed in the metal layer formation step; and a silicon oxide layer formation step of forming a silicon oxide layer on the metal layer annealed in the annealing step. The metal layer formation step forms the metal layer by using a deposition setting type metal compound. The annealing step anneals the metal layer at a temperature higher than a recrystallization temperature of the metal that forms the metal layer.