Title:
MANUFACTURING METHOD FOR BUFFER LAYER AND MANUFACTURING METHOD FOR PHOTOELECTRIC CONVERSION ELEMENT
Document Type and Number:
Japanese Patent JP2012195520
Kind Code:
A
Abstract:
To provide a manufacturing method for buffer layer of photoelectric conversion element, capable of effectively removing adhering colloid-like solid on a deposition film surface by chemical bath deposition process.
The colloid-like solid adhering to a buffer layer surface that is a deposition film deposited by chemical bath deposition process is removed by at least one of ultrasonic cleaning using a plurality of ultrasonic waves with different frequencies and brush cleaning.
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Inventors:
KAGA HIROSHI
KONO TETSUO
KONO TETSUO
Application Number:
JP2011059999A
Publication Date:
October 11, 2012
Filing Date:
March 18, 2011
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
H01L31/04; H01L21/368
Attorney, Agent or Firm:
佐久間 剛
柳田 征史
柳田 征史