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Title:
電気光学装置の製造方法
Document Type and Number:
Japanese Patent JP4984815
Kind Code:
B2
Abstract:

To provide an active matrix substrate capable of reducing alignment time for inspection and minimizing waste of products judged as defective by inspection.

The active matrix substrate 20 includes mounting terminals 26 connected to a plurality of scanning lines WL and a plurality of data lines DL, an inspection circuit 30, and inspection terminals 32 connected to the inspection circuit 30 and being in a smaller number with a wider pitch and a larger area than the mounting terminals 26. In first and second inspection steps, the substrate is inspected by connecting an inspection device 100 to the inspection circuit 30 disposed on the active matrix substrate 20; and in a cutting step, the substrate 20 and a plurality of inspection wiring lines 28 are cut at a position between the plurality of mounting terminals 26 and the inspection circuit 30.

COPYRIGHT: (C)2008,JPO&INPIT


Inventors:
Takeshi Nozawa
Yukiyuki Kitazawa
Application Number:
JP2006285119A
Publication Date:
July 25, 2012
Filing Date:
October 19, 2006
Export Citation:
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Assignee:
Seiko Epson Corporation
International Classes:
G09F9/30; G01M11/00; G01R31/00; G02F1/13; G02F1/1368; G09F9/00; G09G3/20; G09G3/30; G09G3/36; H01L51/50; H05B33/10; H05B33/12
Domestic Patent References:
JP2004271847A
JP2001296507A
JP2002296620A
JP2000284246A
JP2004347749A
JP2001209022A
JP2006162701A
JP2004286962A
JP7333275A
Attorney, Agent or Firm:
Inoue Ichi
Takekoshi Noboru
Enami Tomokazu
Yasushi Kuroda



 
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