To reduce pattern abnormality by removing foreign materials sticking to a resist film.

The resist film 301 is washed by using a washing liquid to remove (S6)foreign materials such as potassium bromide sticking to the resist film 301. Since the foreign material is not limited to potassium bromide and different foreign materials stick to the resist film 301 depending on conditions of various processes, it is possible to wash the resist film by using a washing liquid suitable to remove the foreign materials from the resist film 301. For example, the washing liquid whose pH value is adjusted so that the foreign materials sticking to the resist film 301 can be removed can be used to wash the resist film 301.