Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MANUFACTURING METHOD OF EMITTER FOR FIELD EMISSION ELEMENT
Document Type and Number:
Japanese Patent JP2009252689
Kind Code:
A
Abstract:

To provide a manufacturing method of an emitter for a field emission element that never produces a step on a substrate in manufacturing the emitter by erecting a part of a thin emitter material layer, and thereby capable of providing a high-reliability field emission element.

A sacrifice layer hill 20 with at least a part of a circumferential side surface formed into a slope 21 is formed in a local part of a substrate 10. An emitter material layer 30 is formed on the substrate 10 and the sacrifice layer hill 20. By patterning the emitter material layer 30, emitter constituting patterns 32 each having an electron emission end 31 at a tip are formed on parts riding on the slope 21 of the sacrifice layer hill 20. Cantilever structures with the electron emission ends 31 of the emitter constituting patterns 32 lifted from the substrate 10 are made by removing the sacrifice layer hill 20. The emitters are formed by erecting the cantilever structures in a direction vertical to the substrate.


Inventors:
NAGAO MASAYOSHI
YOSHIDA TOMOYA
KANAMARU MASATAKE
Application Number:
JP2008102459A
Publication Date:
October 29, 2009
Filing Date:
April 10, 2008
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NAT INST OF ADV IND & TECHNOL
International Classes:
H01J9/02; H01J1/304
Domestic Patent References:
JPH1012123A1998-01-16
JPH08273522A1996-10-18
JP2003229046A2003-08-15
JPH11162327A1999-06-18