MANUFACTURING METHOD OF FERROELECTRIC THIN FILM

Japanese Patent JP2006172929

A

To form a ferroelectric thin film by depositing ferroelectric microparticles on a substrate while aligning the polarization direction thereof by using the electrophoresis depositing method, while reducing damages including breakage of formed electronic elements.

A method for manufacturing the ferroelectric thin film comprises a step of disposing a liquid 103a in which the substrate 105 is put, and a dispersion liquid 104a in which the ferroelectric microparticles 104b are dispersed such that the ferroelectric microparticles 104b can diffuse from the dispersion liquid 104a to the liquid 103a; and a step of depositing the ferroelectric microparticles 104b on the substrate 105 by making the ferroelectric microparticles 104b in the dispersion liquid 104a migrate toward the substrate 105, by forming an electric field in the surrounding of the ferroelectric microparticles 104b in the dispersion liquid 104a. The substrate 105 is disposed farther than a prescribed distance apart from the dispersion liquid 104a.

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IDA SHINTARO
KATO TAKEHISA

JP2004364480A

June 29, 2006

December 16, 2004

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MATSUSHITA ELECTRIC IND CO LTD

H01B19/00; C25D13/00; H01L21/316; H01L21/8246; H01L27/105; C01G35/00

Hiroshi Maeda
Hiroshi Koyama
Hiroshi Takeuchi
Takahisa Shimada
Yuji Takeuchi
Katsumi Imae
Atsushi Fujita
Kazunari Ninomiya
Tomoo Harada
Iseki Katsumori

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