Title:
MANUFACTURING METHOD OF FINE STRUCTURE
Document Type and Number:
Japanese Patent JP2001284289
Kind Code:
A
Abstract:
To provide a patterning means which has precision of micron order and forms a good functional thin film in a simple process.
A lyophilic part and a liquid-repellant part are formed in a prescribed pattern by using an organic film (14) on a substrate surface, and a functional thin film (13) is formed selectively in a lyophilic part on the substrate by a spin coating method.
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Inventors:
ISHIDA MASAYA
FURUSAWA MASAHIRO
FURUSAWA MASAHIRO
Application Number:
JP2000098158A
Publication Date:
October 12, 2001
Filing Date:
March 31, 2000
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
G03F7/38; B05D1/40; B05D7/04; H01L21/28; H01L21/288; H01L21/316; H01L21/3205; H01L29/06; (IPC1-7): H01L21/288; B05D1/40; B05D7/04; G03F7/38; H01L21/28; H01L21/316; H01L21/3205; H01L29/06
Attorney, Agent or Firm:
Masanori Ueyanagi (1 outside)
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