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Title:
MANUFACTURING METHOD FOR HIGH-PURITY ZIRCONIUM OR HAFNIUM POWDER
Document Type and Number:
Japanese Patent JP2009057634
Kind Code:
A
Abstract:

To provide a method for manufacturing high-purity zirconium or halfnium powder at a low cost and with safety, capable of reducing impurities thereof, which are obstacles to assurance of operational functions of a semi-conductor.

The method for manufacturing the high-purity zirconium or halfnium powder includes the steps of: applying electron beam to zirconium or halfnium raw material for melting it to a high-purity level and casting the resultant molten metal into an ingot; heating an ingot or chips of the resultant high-purity zirconium or hafnium to 500C in a hydrogen atmosphere to be hydrogenated; cooling the ingot and peeling the zirconium or halfnium hydride powder from the ingot to obtain high-purity zirconium hydride or halfnium hydride powder; and removing hydrogen from the high-purity zirconium hydride or halfnium hydride powder.


Inventors:
SHINDO YUICHIRO
Application Number:
JP2008240746A
Publication Date:
March 19, 2009
Filing Date:
September 19, 2008
Export Citation:
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Assignee:
NIKKO KINZOKU KK
International Classes:
B22F9/04; C22B9/04; C22B34/14; C22C16/00; C22C27/00
Domestic Patent References:
JPS63143209A1988-06-15
JPH04350105A1992-12-04
JPH04358030A1992-12-11
JPH05163508A1993-06-29
JPH07118710A1995-05-09
JPH1150110A1999-02-23
JPH1017908A1998-01-20
JP2001050160A2001-02-23
JPS63143209A1988-06-15
JPH04350105A1992-12-04
JPH04358030A1992-12-11
JPH05163508A1993-06-29
JPH07118710A1995-05-09
JPH1150110A1999-02-23
JPH1017908A1998-01-20
JPH0610016A1994-01-18
JPH0754017A1995-02-28
Attorney, Agent or Firm:
Isamu Ogoshi