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Title:
MANUFACTURING METHOD INORGANIC OXIDE SEMICONDUCTOR ELECTRODE FOR PHOTOELECTRIC CONVERSION
Document Type and Number:
Japanese Patent JP2004071252
Kind Code:
A
Abstract:

To provide a manufacturing process capable of forming at a low temperature an inorganic oxide semiconductor layer on an inorganic oxide porous excellent in conversion efficiency by using a resin substrate, and to enable manufacturing a photoelectric conversion electrode and a photoelectric conversion cell using the inorganic oxide semiconductor layer.

An ultrasonic welding processing is performed by bringing a horn which transmits vibration energy in contact with an ultrasonic vibrator into intimate contact with an inorganic oxide particle layer with a mean particle diameter of not less than 5 and not more than 500 nm formed on a transparent electrode surface.


Inventors:
ANDOU MUNENORI
KURATA RYUICHIRO
Application Number:
JP2002226637A
Publication Date:
March 04, 2004
Filing Date:
August 02, 2002
Export Citation:
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Assignee:
TOYO INK MFG CO
International Classes:
H01L31/04; H01M14/00; (IPC1-7): H01M14/00; H01L31/04