Title:
マスクブランク用基板の製造方法、マスクブランクの製造方法及び転写用マスクの製造方法
Document Type and Number:
Japanese Patent JP5882504
Kind Code:
B2
Abstract:
A method for manufacturing a low-defect and high-quality mask blank substrate with minimized transfer pattern defects and high mechanical strength, particularly such that the occurrence of a phenomenon where a portion of a transfer pattern and a principal surface of the substrate therebeneath are broken off together is minimized such that there is little pattern loss. The mask blank is manufactured by preparing a mask blank substrate (X) having a substrate principal surface (X1) polished using a polishing solution containing abrasive grains, etching the substrate principal surface (X1) using catalyst-referred etching so as to remove damaged portions from the principal surface (X1), and then depositing a thin film that forms a transfer pattern on the substrate principal surface (X1) of the substrate (X) by sputtering.
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Inventors:
Takeyuki Yamada
Takahito Nishimura
Takahito Nishimura
Application Number:
JP2014557425A
Publication Date:
March 09, 2016
Filing Date:
January 08, 2014
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/82; B24B37/10; C03C15/00; G03F1/54; G03F1/60; G03F1/80
Domestic Patent References:
| JP2012064972A | 2012-03-29 | |||
| JP2010188487A | 2010-09-02 | |||
| JP2008081389A | 2008-04-10 | |||
| JP2008071857A | 2008-03-27 | |||
| JP2006114632A | 2006-04-27 |
Attorney, Agent or Firm:
Yutaka Nagata
Takafumi Oshima
Tsukasa Ota
Takafumi Oshima
Tsukasa Ota
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