Title:
MANUFACTURING METHOD OF MASK FOR FOCUS MONITOR, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP3854241
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a mask for a focus monitor which can form a highly precise monitor mark in a short time by using charged beams.
SOLUTION: This manufacturing method comprises a process of forming a first opening and a second opening 21 having a pattern shape corresponding to the first opening and surrounded by a laminated film consisting of a halftone film 2 on a translucent substrate and a light shielding film 3 on the halftone film in the surface region of the translucent substrate 1, and a process of etching the translucent substrate inside the second opening by irradiating an edge part of the second opening, the inside part of the second opening, and the outside part of the second opening with charged beams 52.
Inventors:
Shingo Kanemitsu
Kyoko Dewa
Soichi Inoue
Shinichi Ito
Takashi Hirano
Kyoko Dewa
Soichi Inoue
Shinichi Ito
Takashi Hirano
Application Number:
JP2003122339A
Publication Date:
December 06, 2006
Filing Date:
April 25, 2003
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
H01L21/027; A61N5/00; G03C5/00; G03F1/26; G03F1/32; G03F1/68; G03F7/20; G03F9/00; G21G5/00; (IPC1-7): H01L21/027; G03F1/08; G03F7/20
Domestic Patent References:
| JP2001100392A | ||||
| JP2002299205A | ||||
| JP7056322A | ||||
| JP2002311568A | ||||
| JP2001343733A | ||||
| JP8272070A | ||||
| JP6204305A | ||||
| JP2002289503A | ||||
| JP2002221783A | ||||
| JP2002055435A | ||||
| JP2001351853A | ||||
| JP2001189264A | ||||
| JP2001102282A |
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto