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Title:
MANUFACTURING METHOD OF MASK
Document Type and Number:
Japanese Patent JP2006210038
Kind Code:
A
Abstract:

To provide a manufacturing method of a mask in which the mask is manufactured with high precision, even when the mask is made large in size, and deterioration of yield at manufacturing of mask is prevented.

The manufacturing method of the mask 50 comprises a mask member arrangement process, in which a mask member 20 having an aperture 22 of prescribed pattern formed, is arranged at the alignment substrate 38, a base member arrangement process, in which a base member 38 having an aperture 40 formed at the location corresponding to the aperture of the mask member 20 is arranged on the mask member 20, a jointing process in which the base member 38 is fixed to the mask member 20, and a separation process in which the base member 38, jointed with the mask member 20, is separated from the alignment substrate 38.


Inventors:
IKEHARA TADAYOSHI
Application Number:
JP2005017922A
Publication Date:
August 10, 2006
Filing Date:
January 26, 2005
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
H05B33/10; C23C14/04; C23C14/24; H01L51/50
Attorney, Agent or Firm:
Masahiko Ueyanagi
Fujitsuna Hideyoshi
Osamu Suzawa



 
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