To provide a manufacturing method of a metal mask member capable of stably forming evaporation patterns of a low molecular organic layer of an organic EL element and a negative electrode with high precision.

The metal mask member is manufactured through (a) a resist pattern applying process applying a resist pattern functioning as an etching resistant film when manufacturing a metal mask part by etching, to a metal thin plate used as a raw material when processing the metal mask part, (b) a sticking process sticking the metal plate on which, resist pattern is applied, to the frame, and (c) an etching process forming the metal mask by etching the metal thin plate by using the resist pattern as an etching resistant mask, and by forming through holes having prescribed opening at one surface side of the metal plate.