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Title:
MANUFACTURING METHOD OF MICRO ELECTRET PATTERN, AND INSPECTION METHOD THEREOF
Document Type and Number:
Japanese Patent JP2014067826
Kind Code:
A
Abstract:

To provide a manufacturing method of a micro electret pattern which reduces cost, is simplified and improves productivity, and to provide an inspection method of the micro electret pattern which reduces cost, is fast and improves reliability.

A manufacturing method of a micro electret pattern is characterized in forming the micro electret pattern by using any method other than a group of: a method for forming an electret layer on a micro electrode pattern formed by etching a conductive layer on an insulative substrate; a method for forming an electret of an arbitrary charge pattern by charging an insulative substrate subjected to electret making, which is masked so as to expose a position to form the charge pattern; and a method for forming the electret of the arbitrary charge pattern on the insulative substrate subjected to the electret making by means of any one of an electron beam irradiation method, an electron injection method using a backlight thyratron, a laser light irradiation method, an ionization radiation irradiation method and a soft X-ray irradiation method.


Inventors:
SAKAI TOSHIO
SHIMIZU SATOSHI
KAWATO SUSUMU
Application Number:
JP2012000211264
Publication Date:
April 17, 2014
Filing Date:
September 25, 2012
Export Citation:
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Assignee:
TOHO KASEI KK
International Classes:
H01G7/02; H02N1/00; H04R19/01; H04R19/04
Domestic Patent References:
JP2012138514A2012-07-19
JPS52398A1977-01-05
JPS51142699A1976-12-08
JPS5067998A1975-06-06
JPH01161370A1989-06-26
JP2008112781A2008-05-15
JP2012502493A2012-01-26
JPS6287218A1987-04-21
JPH0475483A1992-03-10
JPH097241A1997-01-10
Foreign References:
WO2010032759A12010-03-25
Attorney, Agent or Firm:
特許業務法人池内・佐藤アンドパートナーズ