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Title:
MANUFACTURING METHOD OF MICROSTRUCTURE AND MICROSTRUCTURE
Document Type and Number:
Japanese Patent JP2009090423
Kind Code:
A
Abstract:

To provide a manufacturing method of a new microstructure having a metal nanostructure which generates an intensified electric field by an antenna effect of a sharpened tip portion, and to provide the microstructure.

The manufacturing method of the microstructure includes a micropore-forming step, a metal filling step, and an exposure step. The micropore-forming step forms a micropore on a base material, wherein the micropore has an opening in a surface of the base material, an inside diameter varies in a depth direction, and it has a recessed portion which protrudes more slenderly at an end portion. The metal filling step fills the micropore with metal, and forms a metal microbody having a projection at a tip portion, wherein the projection consists of the metal filled into the protruded recessed portion. The exposure step removes at least a part of the base material from the tip portion side of the metal microbody, and exposes at least the projection at the tip portion of the metal microbody. The manufacturing method of the microstructure having the metal microbody to generate the intensified electric field includes these steps.


Inventors:
TOMARU YUICHI
Application Number:
JP2007264320A
Publication Date:
April 30, 2009
Filing Date:
October 10, 2007
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
B82B3/00; B82B1/00; C25D1/00; C25D11/04; C25D11/18; C25D11/20; C25D11/24; G01N21/65
Domestic Patent References:
JP2006349462A2006-12-28
JP2007240361A2007-09-20
JP2006349463A2006-12-28
JP2005156695A2005-06-16
JP2006349462A2006-12-28
JP2007240361A2007-09-20
Foreign References:
US20040023046A12004-02-05
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa