To enable formation of an alignment pattern which achieves high visibility and avoids affecting the increase of a residual film in a manufacturing of a mold.

In a manufacturing method of a mold 1, a visible thin film 3 and a resist film 4 are formed on a surface of an uneven substrate 14 where patterns 12 and 13 are formed on the surface, and a step substrate 5 is pressed against the resist film 4 so that a portion of the resist film 4, which corresponds to a main pattern region 10, is formed into a recessed part 4a. Subsequently, the step substrate 5 is released and the resist film 4 is etched so that the resist film 4 on the region is removed, the visible thin film 3a on protruding parts of the alignment pattern 13 is exposed, and the visible thin film 3b in recessed parts of the pattern 13 is coated by the resist film 4. Then, the visible thin film 3 is etched using the resist film 4b in the recessed parts as a mask and the resist film 4b is removed.