Title:
MANUFACTURING METHOD OF NONRADIATIVE DIELECTRIC LINE AND NONRADIATIVE DIELECTRIC LINE
Document Type and Number:
Japanese Patent JP2004080241
Kind Code:
A
Abstract:
To form an NRD guide on a board on which an MEMS circuit is mounted by utilizing a semiconductor process.
A conductor film 2 is formed on the board 1 on which the MEMS circuit is mounted, a dielectric A film 3 with a low dielectric constant and a dielectric B film 4 with a high dielectric constant are formed on the film 2, and a conductor film 5 is formed on the films 3, 4. A millimeter wave is guided by the dielectric B film 4 being a dielectric line and propagated while being reflected in the conductors 2, 5.
Inventors:
YUASA MITSUHIRO
Application Number:
JP2002236351A
Publication Date:
March 11, 2004
Filing Date:
August 14, 2002
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01P3/16; H01P11/00; (IPC1-7): H01P3/16; H01P11/00
Attorney, Agent or Firm:
Takashi Ishida
Jun Tsuruta
Koichi Itsubo
Masaya Nishiyama
Higuchi Souji
Jun Tsuruta
Koichi Itsubo
Masaya Nishiyama
Higuchi Souji