To provide a manufacturing method of optical element capable of materializing a diffraction element exhibiting a satisfactory characteristic.
When a diffraction pattern layer 20E is formed by a replica method, a first UV-curing resin 100A is irradiated with UV rays which allow curing reaction to quickly proceed, even though there is a risk of degrading the resin by long-time irradiation over a short curing time, whereby a most part of functional groups of the first UV-curable resin 100A are reacted effectively, and thereafter, the first UV-curing resin 100A is irradiated with an irradiation light, which has a low speed of curing reaction although there is a small risk of degrading the resin because of a low energy level of the resin over an irradiation time longer than the curing time, whereby the functional groups remaining in the first UV-curable resin 100A, of which the speed of curing reaction is left to be small because of disappearance of the fluidity, is made to substantially completely react taking a long time.
YAMADA TAKATOSHI
SATO HITOSHI
SUGANO TAKASHI
AIBA MOTOO
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