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Title:
MANUFACTURING METHOD OF ORGANIC COMPOUND PARTICULATE
Document Type and Number:
Japanese Patent JP2005177746
Kind Code:
A
Abstract:

To provide the manufacturing method of an organic compound particulate which utilizes a poor solvent depositing method of a continuous system and can quickly and uniformly disperse an organic compound solution in quantities of a poor solvent and which can more easily manufacture the organic compound particulate of ≤1 μm volume average grain size.

In the manufacturing method of the organic compound particulate, an organic compound solution obtained by dissolving the organic compound in a good solvent which is miscible with the poor solvent and easily dissolves the organic compound is continuously mixed with the poor solvent which hardly dissolves the organic compound to manufacture the organic compound particulate. The organic compound solution is mixed with the poor solvent under ultrasonic irradiation.


Inventors:
SEKI HIRONARI
ASATANI HARUO
Application Number:
JP2004339722A
Publication Date:
July 07, 2005
Filing Date:
November 25, 2004
Export Citation:
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Assignee:
MITSUBISHI CHEM CORP
International Classes:
B01D9/02; B01J19/10; (IPC1-7): B01D9/02; B01J19/10
Domestic Patent References:
JP2005525216A2005-08-25
JP2004530545A2004-10-07
JP2005524519A2005-08-18
JP2005512763A2005-05-12
JPH05213618A1993-08-24
JP2002533205A2002-10-08
Foreign References:
WO2003061816A12003-07-31
WO2002089942A12002-11-14
WO2003092851A12003-11-13
WO2003035035A12003-05-01
Attorney, Agent or Firm:
Kazuhiko Okada