Title:
MANUFACTURING METHOD OF ORGANIC SOLVENT SOLUBLE COVALENT ORGANIC FRAMEWORK (COF) PRECURSOR, MANUFACTURING METHOD OF COVALENT ORGANIC FRAMEWORK PRECURSOR VARNISH AND FILM USING THE SAME
Document Type and Number:
Japanese Patent JP2017057299
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an organic solvent soluble covalent organic framework (COF) precursor, a manufacturing method of a covalent organic framework (COF) precursor varnish and a film using the same.SOLUTION: A manufacturing method of a covalent organic framework (COF) precursor comprises the steps of: dissolving or dispersing an arylene diboronic acid represented by the formula (I) or an allene triyl tri-boronic acid compound having a specific structure and a polyfunctional phenolic compound having a specific structure or a polyhydroxy triphenylene compound as polyalcohol in a reactive solvent; and heating them and subjecting them to partially dehydrogenation condensation. When the precipitate is filtrated and the filtration residue is dissolved in N,N-dimethylformamide (DMF), the nonvolatile component is 10 mass% or more.SELECTED DRAWING: Figure 1
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Inventors:
MIZUGUCHI NANAKO
MATSUTANI HIROSHI
KAMIYAMA KENICHI
MATSUTANI HIROSHI
KAMIYAMA KENICHI
Application Number:
JP2015184024A
Publication Date:
March 23, 2017
Filing Date:
September 17, 2015
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C08G79/08; C09D185/04