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Title:
MANUFACTURING METHOD OF PHOTOMASK BLANK AND MANUFACTURING METHOD OF PHOTOMASK
Document Type and Number:
Japanese Patent JP2009251497
Kind Code:
A
Abstract:

To provide a manufacturing method of photomask blank which is capable of forming a resist film having a uniform film thickness against the coating direction, and a manufacturing method of a photomask.

In this manufacturing method of a photomask blank, a photomask blank is manufactured by raising a resist liquid 21 by a capillary phenomenon of a nozzle 22, by having a liquid contact of the raised resist liquid 21 and a face to be coated 10a of a substrate 10 which is faced downward, by relatively moving the nozzle 22 and the substrate 10 and by forming a resist film on the face to be coated 10a. A capillary force which acts on the resist liquid 21 in the capillary phenomenon is controlled, so that the film thickness of the resist film of the coating direction which is formed on the face to be coated 10a of the substrate 10 is controlled.


Inventors:
NODA EISHIRO
Application Number:
JP2008102342A
Publication Date:
October 29, 2009
Filing Date:
April 10, 2008
Export Citation:
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Assignee:
HOYA CORP
International Classes:
B05C5/02; B05D1/28; G03F1/50; H01L21/027
Domestic Patent References:
JP2004164873A2004-06-10
JP2004311884A2004-11-04
JP2004006762A2004-01-08
JP2005286232A2005-10-13
JP2004335728A2004-11-25
JPH1157587A1999-03-02
JPH11253869A1999-09-21
JPH1176894A1999-03-23
JP2006289252A2006-10-26
JP2005152716A2005-06-16
JP2003340355A2003-12-02
JP2004164873A2004-06-10
JP2004311884A2004-11-04
JP2004006762A2004-01-08
JP2005286232A2005-10-13
JP2004335728A2004-11-25
JPH1157587A1999-03-02
JPH11253869A1999-09-21
JPH1176894A1999-03-23
JP2008283098A2008-11-20
JP2009010247A2009-01-15
JP2009010246A2009-01-15
Attorney, Agent or Firm:
Hiroyoshi Aoki
Amada Masayuki
Yoshimasa Okada
Toru Kanno



 
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