Title:
MANUFACTURING METHOD OF PHOTOMASK
Document Type and Number:
Japanese Patent JP2021176002
Kind Code:
A
Abstract:
To provide a manufacturing method of a photomask which can form a pattern having different optical characteristics, by suppressing occurrence of superposition error during exposure.SOLUTION: A photomask blanks having a semi transparent film, an intermediate film and an upper layer on a transparent substrate is prepared, and a photoresist film formed on the upper layer is exposed to form a first region, a second region and a third region having different exposure amounts. Thereafter, the first region is selectively removed to etch the upper layer film. Thereafter, the second region is selectively removed, the semi-transparent film is etched, and the upper film and the intermediate film are etched. Thereafter, the third region is removed.SELECTED DRAWING: Figure 2
Inventors:
OJIMA SHOJIRO
YAMADA SHINGO
MORIYAMA KUMIKO
YAMADA SHINGO
MORIYAMA KUMIKO
Application Number:
JP2020173464A
Publication Date:
November 04, 2021
Filing Date:
October 14, 2020
Export Citation:
Assignee:
SK ELECTRONICS CO LTD
International Classes:
G03F1/00; G03F1/32; G03F1/58; G03F1/80; G03F7/20
Attorney, Agent or Firm:
Moriwaki Patent Office