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Title:
MANUFACTURING METHOD OF POLYAZO COMPOUND AND DIAZONIUM SALT
Document Type and Number:
Japanese Patent JP2002302621
Kind Code:
A
Abstract:

To provide a manufacturing method of a polyazo compound in a high yield.

Using a diazonium salt having at least an isolated bisazo structure represented by general formula (1) as a raw material, a polyazo compound represented by general formula (2) is prepared. (wherein Ar1-Ar3 and R4 represent each independently an aryl group or heteroaryl group; n represents 1 or 2, but diazonium groups represented by n1 pieces of -N2+ are included in the substituents which at least one of Ar1-Ar3 has; M represents a hexafluorophosphoric acid ion, tetrafluoroboric acid ion, perchloric acid ion, or organic sulfonic acid ion; and n2 represents a number required to neutralize the charges in the molecule).


Inventors:
KATO TAKASHI
Application Number:
JP2001107253A
Publication Date:
October 18, 2002
Filing Date:
April 05, 2001
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
C07D295/12; C07C245/20; C07D213/76; C07D277/82; C09B31/18; C09B31/20; C09B41/00; (IPC1-7): C09B41/00; C07C245/20; C07D213/76; C07D277/82; C07D295/12; C09B31/18; C09B31/20
Attorney, Agent or Firm:
Atsushi Kamata (2 outside)



 
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