Title:
MANUFACTURING METHOD OF PRINTING SUBSTRATE
Document Type and Number:
Japanese Patent JP2019155652
Kind Code:
A
Abstract:
To realize transfer of coating liquid having excellent uniformity of film thickness.SOLUTION: In a manufacturing method of a substrate S for liquid crystal panel, by rotating an anilox roll 12 on an external surface of which a first recessed part is formed and by rotating a plate cylinder 14 to which a flexographic plate 15, on an external surface of which a second recessed part is formed and which contacts an external surface of the anilox roll 12, is attached, coating liquid CL is transferred from the first recessed part to the second recessed part, and by rotating the plate cylinder 14 while allowing the external surface of the flexographic plate 15 to contact a plate surface of the substrate S for liquid crystal panel, the coating liquid CL held by the second recessed part is transferred on the plate surface of the substrate S for liquid crystal panel. A ratio MVA2/MVA1 between the maximum holding volume MVA1 of the coating liquid CL by the first recessed part per unit area on the external surface of the anilox roll 12 and the maximum holding volume MVA2 of the coating liquid CL by the second recessed part per unit area on the external surface of the flexographic plate 15 is within the range of 0.50 to 2.00.SELECTED DRAWING: Figure 1
Inventors:
TANIIKE KOUSHIRO
Application Number:
JP2018042863A
Publication Date:
September 19, 2019
Filing Date:
March 09, 2018
Export Citation:
Assignee:
SHARP KK
International Classes:
B41M1/04; B41F17/14; B41M1/34
Domestic Patent References:
| JPH09131959A | 1997-05-20 | |||
| JPH09211455A | 1997-08-15 | |||
| JP2008132662A | 2008-06-12 | |||
| JP2016076538A | 2016-05-12 |
Foreign References:
| US20180056688A1 | 2018-03-01 |
Attorney, Agent or Firm:
Akatsuki Joint Patent Office