Title:
Manufacturing method of semiconductor device
Document Type and Number:
Japanese Patent JP5906597
Kind Code:
B2
Inventors:
Toshiaki Itobayashi
Application Number:
JP2011168876A
Publication Date:
April 20, 2016
Filing Date:
August 02, 2011
Export Citation:
Assignee:
Nichia Corporation
International Classes:
H01L33/52
Domestic Patent References:
JP2008311477A | ||||
JP2004063554A | ||||
JP2007311663A | ||||
JP2010135763A | ||||
JP2008036912A |
Foreign References:
US20100103645 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation