Title:
シリコンエピタキシャルウェーハの製造方法
Document Type and Number:
Japanese Patent JP4670317
Kind Code:
B2
Inventors:
Kitamura Ikuo
Tadashi Niwayama
Rintaro Sato
Tadashi Niwayama
Rintaro Sato
Application Number:
JP2004327917A
Publication Date:
April 13, 2011
Filing Date:
November 11, 2004
Export Citation:
Assignee:
Shin-Etsu Semiconductor Co., Ltd.
International Classes:
C30B29/06; C23C16/24; C23C16/458; H01L21/20; H01L21/205
Domestic Patent References:
| JP11106287A | ||||
| JP2001253797A | ||||
| JP1058929U | ||||
| JP9199381A |
Attorney, Agent or Firm:
Mikio Yoshimiya