Title:
MANUFACTURING METHOD OF SOLAR CELL
Document Type and Number:
Japanese Patent JP2018157113
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method of a solar cell, by which a third semiconductor layer and a fourth semiconductor layer are not stacked on a second semiconductor layer while passivating one surface of a semiconductor substrate, by a simple process.SOLUTION: An etching mask layer is formed on a part of a second semiconductor layer 2 on a first semiconductor layer 1. The first and second semiconductor layers 1 and 2 are etched. A third semiconductor layer 3 is formed on a part of one surface 51 and on the etching mask layer. A fourth semiconductor layer 4 is formed on the third semiconductor layer 3. The etching mask layer is heated to generate gas from the etching mask layer, and the etching mask layer and the third and fourth semiconductor layers 3 and 4 on the etching mask layer are removed.SELECTED DRAWING: Figure 1
Inventors:
TAKAGISHI HIDEYUKI
NOGE HIROSHI
SAITO KIMIHIKO
NOGE HIROSHI
SAITO KIMIHIKO
Application Number:
JP2017053649A
Publication Date:
October 04, 2018
Filing Date:
March 17, 2017
Export Citation:
Assignee:
UNIV FUKUSHIMA
International Classes:
H01L31/0747
Attorney, Agent or Firm:
Patent business corporation Hokuto patent office