Title:
MANUFACTURING METHOD OF THIN-FILM RESONATOR
Document Type and Number:
Japanese Patent JP2006135529
Kind Code:
A
Abstract:
To improve yield in the manufacturing method of a thin-film resonator forming a cavity by using a sacrifice layer.
A solution including dielectric 4a is coated on the surface of an Si substrate 1 including a recess 3 by a spin-on, and then a spin-on film 4 is formed. The coated dielectric 4a is sintered with heat processing. At that time, by adjusting a thickness of a solution coated so that the thickness of the dielectric 4a after sintering may be the same depth of the concave 3, the recess 3 is filled with the dielectric 4a (sacrificing layer) and the surface of the Si substrate 1 is smoothed without using mechanochemical processing like chemical mechanic polishing.
More Like This:
Inventors:
YAMAZAKI HAJIME
SHIBA FUMIHIRO
SHIBA FUMIHIRO
Application Number:
JP2004320975A
Publication Date:
May 25, 2006
Filing Date:
November 04, 2004
Export Citation:
Assignee:
JAPAN RADIO CO LTD
International Classes:
H03H3/02; H01L41/09; H01L41/187; H01L41/22; H03H9/17
Domestic Patent References:
JP2002140075A | 2002-05-17 | |||
JP2001111371A | 2001-04-20 | |||
JP2002246180A | 2002-08-30 | |||
JP2003347884A | 2003-12-05 | |||
JP2004514313A | 2004-05-13 |
Foreign References:
WO2002093549A1 | 2002-11-21 |
Attorney, Agent or Firm:
Kenji Yoshida
Jun Ishida
Jun Ishida