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Title:
MANUFACTURING METHOD OF TRANSLUCENT CONDUCTIVE THIN FILM, AND TRANSLUCENT CONDUCTIVE THIN FILM
Document Type and Number:
Japanese Patent JP2009076358
Kind Code:
A
Abstract:

To provide a manufacturing method of a translucent conductive film having a high transmittance by preventing smear of silver which adheres to a silver halide sensitive material during a chemical and/or physical development, and further, to obtain a translucent conductive film without smear adhesion and having a high transmittance.

This is a manufacturing method of a translucent conductive film in which, after a thin line pattern is exposed on a silver halide sensitive material having a sensitive silver halide layer on a substrate, a chemical development processing is carried out, and further, as required, at least any of processing of a physical development and plating is carried out. When the silver halide sensitive material is processed by an automatic development processor after exposure of the thin-line pattern, a film having hydrophilic colloid layer is passed through the automatic development processor immediately before at least any of the processing of the chemical development and physical development of the silver halide sensitive material is carried out.


Inventors:
Uno, Mitsuhiko
Sakata, Kazuhiko
Uda, Takashi
Goto, Masanori
Application Number:
JP2007000245097
Publication Date:
April 09, 2009
Filing Date:
September 21, 2007
Export Citation:
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Assignee:
KONICA MINOLTA HOLDINGS INC
International Classes:
H01B13/00; G03C5/26; H01B5/14; H01J11/44