Title:
MANUFACTURING METHOD OF TRIALKYLGALLIUM COMPOUND
Document Type and Number:
Japanese Patent JP2017132788
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method capable of manufacturing trialkylgallium (RGa) at low cost.SOLUTION: There is provided a manufacturing method of RGa by operation at over 30°C lower temperature than the melting point of a RGaCltype, where R is a C1 to C5 alkyl group, c, d=1 or 2 and c;d=3, most volatile partially alkylated product formed in a reaction mixture when gallium trichloride (GaCl) and an alkyl ammonium compound such as methyl aluminum sesquichloride (MeAlCl) and trimethyl aluminum (MeAl are reacted in presence of at least 2 kinds of alkali metal halides such as NaCl or KCl and then a reaction mixture id heated to a temperature in a range of 120 to 250°C to distilled separate RGa.SELECTED DRAWING: None
Inventors:
RALF KARCH
ANDREAS RIVAS-NASS
ANNIKA FREY
TOBIAS BURKERT
EILEEN WOERNER
ANGELINO DOPPIU
ANDREAS RIVAS-NASS
ANNIKA FREY
TOBIAS BURKERT
EILEEN WOERNER
ANGELINO DOPPIU
Application Number:
JP2017054179A
Publication Date:
August 03, 2017
Filing Date:
March 21, 2017
Export Citation:
Assignee:
UMICORE AG & CO KG
International Classes:
C07F1/06
Domestic Patent References:
JPH02295991A | 1990-12-06 | |||
JP2002533348A | 2002-10-08 | |||
JP2009067786A | 2009-04-02 |
Foreign References:
CN1872862A | 2006-12-06 |
Other References:
STAROWIEYSKI KAZIMIERZ B, APPLIED ORGANOMETALLIC CHEMISTRY, vol. V14 N10, JPN5015001553, 2000, pages 616 - 622, ISSN: 0004091496
Attorney, Agent or Firm:
Yasuhiko Murayama
Shinya Mitsuhiro
Tatsuhiko Abe
Shinya Mitsuhiro
Tatsuhiko Abe
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