Title:
MARK DETECTING METHOD, EXPOSURE METHOD AND ALIGNER
Document Type and Number:
Japanese Patent JP2001274058
Kind Code:
A
Abstract:
To reliably detect the mark of an object of instrumentation even the time when marks of the same kind as that of the mark exist in close vicinity of the mark which is used as the object of instrumentation.
In the case where a mark on a wafer W is detected using a mark detecting system 9 having a prescribed measuring region 21, the system 9 decides whether a mark which is detected on the region 21 is an object mark OM1 or not on the basis of mark relative position information 19a and the like on the positions relative to the object mark OM1 and the like of an object of instrumentation being previously obtained and the non-object mark NM1 and the like of an object of non-instrumentation and the object mark OM1 and the like are specified.
Inventors:
YASUDA MASAHIKO
Application Number:
JP2000085286A
Publication Date:
October 05, 2001
Filing Date:
March 24, 2000
Export Citation:
Assignee:
NIKON CORP
International Classes:
G01B11/00; G03F9/00; H01L21/027; (IPC1-7): H01L21/027; G01B11/00; G03F9/00
Attorney, Agent or Firm:
Masatake Shiga (5 outside)
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