Title:
AFMに電気化学的手法を適用したマスク黒欠陥修正
Document Type and Number:
Japanese Patent JP4361405
Kind Code:
B2
Inventors:
Naoya Watanabe
Hiroshi Muramatsu
Hiroshi Muramatsu
Application Number:
JP2004074140A
Publication Date:
November 11, 2009
Filing Date:
March 16, 2004
Export Citation:
Assignee:
SII Nanotechnology Co., Ltd.
International Classes:
B82B3/00; B82Y10/00; B82Y15/00; B82Y40/00; G01Q30/02; G01Q60/10; G01Q60/38; G01Q60/40; G01Q60/60; G01Q80/00; G03F1/72; H01L21/027
Domestic Patent References:
| JP2002214760A | ||||
| JP9267218A | ||||
| JP2002355799A | ||||
| JP10283970A | ||||
| JP2002214759A | ||||
| JP2006504136A | ||||
| JP7174542A |
Attorney, Agent or Firm:
Yoshiharu Matsushita