マスクブランク、転写用マスクおよび半導体デバイスの製造方法

Japanese Patent JP7179543

B2

To provide a mask blank having a function of transmitting exposure light of an ArF excimer laser at a predetermined transmittance and having a reduced reflectance on a back surface.SOLUTION: The mask blank includes a pattern-forming thin film disposed on one main surface of a light-transmitting substrate, and an antireflection film disposed on the other main surface and having a stacked structure of, from the light-transmitting substrate side, a first layer, a second layer and a third layer. Refractive indices n, n, nof the first layer, the second layer and the third layer, respectively, at a wavelength of exposure light by an ArF excimer laser satisfy the relationship of nn. Extinction coefficients k, k, kof the first layer, the second layer and the third layer, respectively, at the wavelength of the exposure light satisfy the relationship of k>k>k. Film thicknesses d, d, dof the first layer, the second layer and the third layer, respectively, satisfy the relationship of d>dand d