Title:
MASK CLEANING LIQUID COMPOSITION USED AT VACUUM VAPOR DEPOSITION PROCESS OF LOW MOLECULE TYPE ORGANIC EL ELEMENT, AND CLEANING METHOD
Document Type and Number:
Japanese Patent JP3877758
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a cleaning liquid composition and a cleaning method capable of removing various organic materials adhered to the mask at a vacuum vapor deposition process of low molecule type organic EL element by one kind of cleaning liquid.
SOLUTION: The mask used at the vacuum vapor deposition process of low molecule type organic EL element is rinsed by using hydrofluoroether after cleaning it by immersing it in a cleaning water composition containing an aprotic polar solvent or by a jet flow thereof. The low molecule type organic EL element structure contains N,N'-di(naphthalene-1-yl)-N,N'-diphenyl-benzin, copper(II)phthalocyanine, and tris(8-quinolinolato)aluminum. The aprotic polar solvent is one or not less than two kinds selected from N,N'-dimethylformamide, N-methyl-2-pyrrolidinone, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, 1,4-dioxane, and cyclohexane.
Inventors:
Norio Ishikawa
Yoshitaka Kinomura
Hideki Mudani
Yoshitaka Kinomura
Hideki Mudani
Application Number:
JP2006146373A
Publication Date:
February 07, 2007
Filing Date:
May 26, 2006
Export Citation:
Assignee:
Kanto Chemical Co., Ltd.
Sanyo Electric Co., Ltd.
Sanyo Electric Co., Ltd.
International Classes:
C11D7/50; H01L51/50; H05B33/10
Domestic Patent References:
| JP2002170674A | ||||
| JP2002075641A | ||||
| JP2002170675A | ||||
| JP2001345174A | ||||
| JP2002100472A | ||||
| JP2005161190A |
Attorney, Agent or Firm:
Kiyoji Kuzuwa