Title:
マスク用組成物
Document Type and Number:
Japanese Patent JP7215302
Kind Code:
B2
Abstract:
To provide compositions for masks which can impart antibacterial properties and make-up staining prevention properties.SOLUTION: Provided is a composition for a mask, containing 0.001 to 0.1 mass% of the following component (A), 0.001 to 0.1 mass% of the following component (B), and 0.01 to 0.5 mass% of the following component (C). Component (A): copolymer having a specific structure; component (B): grapefruit seed extract; and component (C): one or more selected from tea extract and persimmon extract.SELECTED DRAWING: None
Inventors:
Tomomi Uchinomiya
Takashi Matsufuji
Takashi Matsufuji
Application Number:
JP2019070325A
Publication Date:
January 31, 2023
Filing Date:
April 02, 2019
Export Citation:
Assignee:
NOF CORPORATION
International Classes:
A01N65/36; A01N65/08; A41D13/11; A61K36/44; A61K36/752; A61K36/82; A61L15/24; A61L15/42; A61L15/44; A61P31/04; A61P43/00; A62B18/02; C08K5/00; C08L43/02
Domestic Patent References:
| JP2006002147A | ||||
| JP2010090040A | ||||
| JP2014218484A | ||||
| JP2011078403A | ||||
| JP2018009282A |
Attorney, Agent or Firm:
Masahiro Taguchi
Shigeo Torayama
Hiroshi Chichimatsu
Shigeo Torayama
Hiroshi Chichimatsu