Title:
MASK FOR EXPOSURE
Document Type and Number:
Japanese Patent JP3158515
Kind Code:
B2
Abstract:
PURPOSE: To provide a mask for exposure which easily solves the problem of a shift of the pattern due to warpage caused in the case where a light shielding film is formed on the surface of the substrate.
CONSTITUTION: In a mask 1 for exposure with a light shielding film 2 on the periphery of the surface of the substrate 10, the light shielding film 2 is divided with slits 3, etc. When this mask for exposure is formed as a negative pattern mask, the precision of superposition on a positive pattern mask is enhanced.
Inventors:
Akira Kojima
Hirokazu Kawahira
Satoru Nozawa
Hirokazu Kawahira
Satoru Nozawa
Application Number:
JP21148191A
Publication Date:
April 23, 2001
Filing Date:
July 29, 1991
Export Citation:
Assignee:
ソニー株式会社
International Classes:
G03F1/54; G03F1/68; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
| JP5891635A |
Attorney, Agent or Firm:
Toru Takatsuki