Title:
MASK FOR HYPERSENSITIVITY TO CHEMICAL SUBSTANCE
Document Type and Number:
Japanese Patent JP2004230105
Kind Code:
A
Abstract:
To provide a mask efficiently removing a chemical substance, particularly low-grade aldehydes, having excellent safety and adsorbing performance and improved in fitting property.
This mask for hypersensitivity to the chemical substance has a layer containing a porous adsorbent, and has a formaldehyde removal rate of 50% or more.
Inventors:
KONISHI TAKESHI
KAWASAKI SEIYA
YOSHIKAWA TAKAYUKI
KAWASAKI SEIYA
YOSHIKAWA TAKAYUKI
Application Number:
JP2003044572A
Publication Date:
August 19, 2004
Filing Date:
February 21, 2003
Export Citation:
Assignee:
KURARAY CO
KURARAY CHEMICAL KK
KURARAY CHEMICAL KK
International Classes:
A62B18/02; A62B18/08; B01J20/22; (IPC1-7): A62B18/02; A62B18/08; B01J20/22
Domestic Patent References:
| JPS60194965A | 1985-10-03 | |||
| JP2001232189A | 2001-08-28 |
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