To provide a mask inspection apparatus which carries out rapid and efficient mask inspection and an exposure method using the same.

The mask inspection apparatus 6 having a contamination detecting means for detecting the sizes, number of pieces and adhesion positions of the contamination 8 on the mask 7 and a discrimination circuit 12 for discriminating the usability or not of the mask 7 in accordance with the output of this contamination detecting means is provided with a foreign matter removing means 14 for removing the contamination 8 on the mask 7 in accordance with a controls signal from the discrimination circuit 12, by which the contamination removal processing within the exposure device is made possible, the rapid and efficient mask inspection processing is realized and the degradation in productivity is prevented.