To provide a mask for inspection which can easily form an image by light almost uniformly in all directions and an inspecting method for an exposure device which can easily inspect an optical system of the exposure device with high precision.
On both surfaces of a translucent substrate 3 that can transmit exposure light 7 including specific wavelength, a light diffusion part 2 which transmits the light 7 while scattering it and a shading part 4 which cuts off the light 7 are put opposite each other to form the mask 1 for inspection. A pinhole 5 which is large enough to pass the light is formed in the center part of the shading part 4. On the side of a lighting optical system 9 of the exposure device 6, the mask 1 is arranged having the pinhole 5 opposite a projection optical system 11, and the wafer 10 is exposed at a position Ad which is a specific quantity (d) off the focus position Aj of the projection optical system 11. An image 17 that light 18 which travels straight in the scatter part 2 and passes through the pinhole 5 forms and an image 18 that light 19 which has its travel direction changed by the light scatter part 2 and passes through the pinhole 5 forms are measured respectively.
SATO KAZUYA
FUJISAWA TADAHITO
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