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Title:
MASK FOR MANUFACTURING ALIGNMENT LAYER AND METHOD OF MANUFACTURING LIQUID CRYSTAL DEVICE
Document Type and Number:
Japanese Patent JP2008083215
Kind Code:
A
Abstract:

To provide a mask for manufacturing an alignment layer, with which an alignment treatment can be carried out in an easy and simple method and workload of a worker required for an alignment work can be reduced.

The mask 60 for manufacturing an alignment layer is to be used in a process of irradiating an alignment layer material 18d with linearly polarized light, and is equipped with: a translucent base 61 that transmits light; a polarizing layer 62 disposed on the translucent base 61 and comprising a plurality of metal thin lines alternately arranged in stripes at a period shorter than the wavelength of light; and an alignment mark A2 disposed on the translucent base 61 and formed of the same metal material as the polarizing layer 62.


Inventors:
OTAKE TOSHIHIRO
Application Number:
JP2006261137A
Publication Date:
April 10, 2008
Filing Date:
September 26, 2006
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
G02F1/1337
Attorney, Agent or Firm:
Masahiko Ueyanagi
Kazuhiko Miyasaka