Title:
MASK PATTERN CORRECTION METHOD AND PROGRAM
Document Type and Number:
Japanese Patent JP2015152853
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To improve fidelity during transfer of a mask pattern.SOLUTION: A work conversion difference compensation part 11a corrects a mask pattern H based on work conversion difference between a resist pattern R to which the mask pattern H is transferred, and a pattern T after being subjected to work. A first auxiliary pattern arrangement part 11b arranges a first auxiliary pattern on a corner of the mask pattern H, and a second auxiliary pattern arrangement part 11c calculates an arrangement position of the second auxiliary pattern based on an aperture angle of the resist pattern R, and arranges the second auxiliary pattern on the arrangement position.
Inventors:
NAKAGAWA SHINICHI
IIDA KAZUNORI
KAJIWARA SEIKI
OKADA MOTOHIRO
IIDA KAZUNORI
KAJIWARA SEIKI
OKADA MOTOHIRO
Application Number:
JP2014028643A
Publication Date:
August 24, 2015
Filing Date:
February 18, 2014
Export Citation:
Assignee:
TOSHIBA CORP
International Classes:
G03F1/36
Attorney, Agent or Firm:
Hiroaki Sakai
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