Title:
MASK FOR PRINTING AND PRINTING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2015044382
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a mask for printing which can suppress position deviation and deformation of a pattern and a printing method using the mask.SOLUTION: A mask for printing comprises: a mask base material 4 which includes printing groove patterns 4a that are formed at the printing surface side and correspond to a pattern to be printed and perforating holes 4b that penetrate to the bottom surface of the printing groove patterns and are of an inner diameter smaller than the bottom surface width; and a holding member 3 which is laminated over the mask base material 4, and includes opening patterns 3a that communicate with the inside of the printing groove patterns through the perforating holes in the mask base material and fill transfer material. And, since the printing groove patterns are connected to each other at surrounding areas 4c other than the perforating holes, position deviation and deformation of the pattern of the mask base material can be suppressed.
Inventors:
MIZUMURA MICHINOBU
Application Number:
JP2013177917A
Publication Date:
March 12, 2015
Filing Date:
August 29, 2013
Export Citation:
Assignee:
V TECHNOLOGY CO LTD
International Classes:
B41N1/24; B41M1/12; H05K3/12
Domestic Patent References:
| JPH0781263A | 1995-03-28 | |||
| JP2007331195A | 2007-12-27 | |||
| JP2013146958A | 2013-08-01 |
Attorney, Agent or Firm:
Moriaki Ogawa
Nishiyama It is this in spring.
Okuyama In addition, it is 1.
Nishiyama It is this in spring.
Okuyama In addition, it is 1.