PURPOSE: To prevent a mask from being distorted by the stress of X-ray shielding patterns by a method wherein, when the X-ray shielding patterns are provided with compressive force, an X-ray transmissive thin film below an X-ray shielding frame patterns is made thicker than an X-ray exposure region.

CONSTITUTION: Within a mask 1 for X-ray exposure provided with compressive force, an X-ray transmissive thin film 2 below the bottom surface of X-ray shielding frame patterns 6 is formed thicker than the film 2 in the region corresponding to an X-ray exposure region 3. Next, the thickness of X-ray transmissive thin film 2 in the regions corresponding to the bottom surface of X-ray shielding frame patterns 6 is specified so that the composite force of compressive force of X-ray shielding frame patterns 6 and the tensile force of X-ray transmissive thin film 2 in the region corresponding to the bottom surface of said patterns 6 may be equivalent to the tensile force of X-ray transmissive thin film 2 in the region corresponding to the X-ray transmissive region 3. Through these procedures, the long pitch precision can be prevented from being deteriorated by the stress of X-ray shielding frame patterns 6.