Title:
MATCHING PATTERN SIGNAL GENERATING METHOD IN PATTERN MATCHING INSPECTION AND DEVICE THEREOF
Document Type and Number:
Japanese Patent JP3267372
Kind Code:
B2
Abstract:
PURPOSE: To make any defect in a mast area effectively detectable by extracting each of both first and second contouring parts crossing and paralleling the scanning direction and then performing a mast expansion process for pattern matching separately.
CONSTITUTION: A first difference processing circuit 8 extracts a first contouring part, crossing the scanning direction of a camera, from a difference between a camera signal A not passing through a delay line 9 and a delay camera signal B, outputting a signal of first contouring data C. The data C are binary-coded (10), and master first contour binary data D2, imparting an expanded master area to this data C is outputted (11). In addition, an AND circuit 7 inputted with real first binary-coded data F binary-coded the data C inputs corresponding data E into a first memory 5 synchronously, and when there is a difference after pattern matching, a signal G is outputted. When a defective object inclusive of this signal G is more than the specified size, a defect is judged (12). On the other hand, a second contouring part in parallel with the scanning direction is extracted (28), and a defective judgment (32) takes place with the same processing as the first one. Therefore a defect in one side mask area is situated at the outside of the other side mast area, whereby it is effectively detectable.
Inventors:
Hideyuki Hanafusa
Masami Nishio
Masami Nishio
Application Number:
JP5360393A
Publication Date:
March 18, 2002
Filing Date:
March 15, 1993
Export Citation:
Assignee:
Hutech Co., Ltd.
International Classes:
G01B11/24; G01B11/245; G01N21/88; G06T1/00; G06T7/00; (IPC1-7): G01N21/88; G01B11/24; G06T1/00; G06T7/00
Domestic Patent References:
| JP588357A | ||||
| JP4294260A | ||||
| JP62280981A |
Attorney, Agent or Firm:
Takehiko Suzue