Title:
MATERIAL FOR FORMING RESISTOR FILM
Document Type and Number:
Japanese Patent JPH04269801
Kind Code:
A
Abstract:
PURPOSE: To provide a material for forming resistor films which can form a resistor thin film having a high specific resistance at a high reproducibility.
CONSTITUTION: This material for forming resist films is prepared by mixing a metal oxide with a Cr-Al alloy containing aluminum by 2-50wt.%. A non- oxidized metal which can be oxidized can be mixed with the alloy instead of the metal oxide.
Inventors:
OZAWA JUICHIRO
INAGAWA KONOSUKE
KURAUCHI TOSHIHARU
MORITA TADASHI
HAKOMORI MUNEHITO
INAGAWA KONOSUKE
KURAUCHI TOSHIHARU
MORITA TADASHI
HAKOMORI MUNEHITO
Application Number:
JP5341591A
Publication Date:
September 25, 1992
Filing Date:
February 25, 1991
Export Citation:
Assignee:
OZAWA JUICHIRO
International Classes:
C22C21/00; C22C27/06; C23C14/14; C23C14/34; H01B1/02; H01C7/00; (IPC1-7): C22C21/00; C22C27/06; C23C14/14; C23C14/34; H01B1/02; H01C7/00
Attorney, Agent or Firm:
Keiji Yamamoto