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Title:
MATERIAL GAS CONCENTRATION CONTROL SYSTEM, MATERIAL GAS CONCENTRATION CONTROL APPARATUS AND CONTROL PROGRAM
Document Type and Number:
Japanese Patent JP2014224307
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a material gas concentration control apparatus which generates a carrier gas or a mixed gas selectively and can prevent overshooting of the material gas concentration contained in the mixed gas without cost increase.SOLUTION: A material gas concentration control apparatus includes a reservoir tank 3 which stores a liquid or solid material, introduces a carrier gas and guides a mixed gas of a vaporized material gas and the carrier gas, a first passage 4 arranged in the downstream of the reservoir tank, a switch valve 5 for causing the mixed gas or the carrier gas selectively to flow into the first passage, a fluid adjustment valve 6 for adjusting the concentration of a gas flowing through the first passage, a concentration sensor 7 for measuring a concentration of the material gas and a control part 8 which executes feedback control of the opening of the fluid adjustment valve so as to cause the measured concentration to approach a set concentration. The control part executes feedback control with the opening of the fluid adjustment valve immediately before switching of the gas flowing through the first passage from the mixed gas to the carrier gas as the initial opening.

Inventors:
HAYASHI TATSUYA
Application Number:
JP2014037922A
Publication Date:
December 04, 2014
Filing Date:
February 28, 2014
Export Citation:
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Assignee:
HORIBA LTD
International Classes:
C23C16/448; C23C16/52; G05D7/06; G05D21/02
Domestic Patent References:
JP2010109303A2010-05-13
JPH06318116A1994-11-15
Attorney, Agent or Firm:
Ryuhei Nishimura
Saito True size
Hiroko Miyake