Title:
MATERIAL FOR METAL PATTERNING, HETEROCYCLIC COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENT ELEMENT, ELECTRONIC EQUIPMENT, AND METHOD OF FORMING METAL PATTERN
Document Type and Number:
Japanese Patent JP2023116425
Kind Code:
A
Abstract:
To provide a material for metal patterning capable of suppressing a metal thin film from being formed on a film surface at high level, a heterocyclic compound, a thin film for metal patterning using them, an organic electroluminescent element, a method of forming a metal pattern, and electronic equipment.SOLUTION: There is provided a material for metal patterning represented by (A1) or (B1) in formula 1. In the formula, A each independently represents N or CR, where at least one is N and at least one is CR, and B represents N, NR, S, O or CR, where at least one is N, S, or O and at least one is CR.SELECTED DRAWING: None
Inventors:
KAWASHIMA HIROYUKI
KOIKE KENJI
MATSUMOTO NAOKI
NOMURA SHINTARO
OTA ERIKO
HATTORI KAZUKI
KOIKE KENJI
MATSUMOTO NAOKI
NOMURA SHINTARO
OTA ERIKO
HATTORI KAZUKI
Application Number:
JP2023018054A
Publication Date:
August 22, 2023
Filing Date:
February 09, 2023
Export Citation:
Assignee:
TOSOH CORP
International Classes:
H10K85/60; C07D213/22; C07D213/53; C07D239/26; C07D241/12; C07D251/16; C07D251/22; C07D251/24; C07D251/46; C07D401/10; C07D401/14; C07D403/04; C07D403/10; C07D403/14; C07D405/04; C07D405/14; C07D409/10; C07D409/14; C07D471/04; C07D471/08; C07D487/04; H01L21/28; H01L21/336; H01L29/786; H10K10/46; H10K50/82; H10K59/10; H10K71/20; H10K85/10