Title:
自己組織化パターン形成用材料およびパターン形成方法
Document Type and Number:
Japanese Patent JP5642126
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a material for forming a self-organization pattern that can make a nanometer order fine pattern in which etching resistance is high.SOLUTION: Provided is a compound in which a silsesquioxane skeleton having a group selected from a group consisting of a substituted or unsubstituted aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, and a siloxanyl group, a disiloxanyl group, a trisiloxanyl group, and a polysiloxanyl group substituted by an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a heterocyclic group, and a hydrogen group, is bonded to an organic group selected from a group consisting of a sugar skeleton, a steroid skeleton, an oligo amino acid skeleton, an oligo lactic acid skeleton, a porphyrin skeleton, and a multiple string type compound skeleton, through a specific divalent bonding hand.
Inventors:
川門前 善洋
木原 尚子
稗田 泰之
山本 亮介
笹尾 典克
鎌田 芳幸
木原 尚子
稗田 泰之
山本 亮介
笹尾 典克
鎌田 芳幸
Application Number:
JP2012190370A
Publication Date:
December 17, 2014
Filing Date:
August 30, 2012
Export Citation:
Assignee:
株式会社東芝
International Classes:
C08G77/42; B82Y40/00; C07F7/21; C07J1/00; C07J51/00; C07K4/00; C08B37/00; C08B37/16; H01L21/3065
Attorney, Agent or Firm:
Masatoshi Kurata
Toshihiro Fukuhara
Makoto Nakamura
Nobuhisa Nogawa
Peak Takashi
Naoki Kono
Sunagawa 克
Iseki Mamoru 3
Takao Akaho
Tadashi Inoue
Tatsushi Sato
Okada Kishi
Mihoko Horiuchi
Toshihiro Fukuhara
Makoto Nakamura
Nobuhisa Nogawa
Peak Takashi
Naoki Kono
Sunagawa 克
Iseki Mamoru 3
Takao Akaho
Tadashi Inoue
Tatsushi Sato
Okada Kishi
Mihoko Horiuchi